发明名称 |
Microwave plasma apparatus for generating a uniform plasma |
摘要 |
A microwave plasma apparatus comprises a discharge chamber for generating a plasma. A dielectric plate is placed on a surface of the discharge chamber. A microwave circuit surrounds the longitudinal side surface of the dielectric plate and the microwave circuit is adapted to couple the signal propagating therein to the dielectric plate, whereby a microwave electric field is formed within the discharge chamber to generate a plasma therein. The microwave circuit may comprise a rectangular waveguide, and a part of a wall surface of the rectangular waveguide is utilized as a terminal portion.
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申请公布号 |
US5359177(A) |
申请公布日期 |
1994.10.25 |
申请号 |
US19910778569 |
申请日期 |
1991.10.17 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TAKI, MASAKAZU;YOSHIZAWA, KENJI;NISHIMAE, JUNICHI;NAMBA, KEISUKE |
分类号 |
H01J37/32;(IPC1-7):B23K9/00;H05H1/46 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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