| 摘要 |
PURPOSE:To detect a minute difference in the opening area of a contact hole as semiconductor integrated circuits become finer. CONSTITUTION:The mask defect inspecting device is provided with a comparison system based on a picture element unit. In addition the device is provided with an area comparison system which contour processes picture element information and compares the information to that picture element information within the contour is added. The picture element information obtained from a mask 1 is contour processed by contour processors 11 and 12 and picture element information within the contour is extracted. Then, the information, to which all picture element information is added, is compared by an area comparator 13. Having this configuration, a slight difference in an opening area of a contact hole is discriminated as a defect. |
