摘要 |
PURPOSE:To provide a resist material excellent in resist properties such as sensitivity, resolution, etching resistance and preservable stability. CONSTITUTION:This resist composition contains a copolymer having structural units expressed by a formula I and formula II and a compound capable of forming an acid by irradiating with activated light in the molecular chain. In the formula I, each of R<1> and R<2> is the same or different from each other and is hydrogen atom, 1-5C alkyl group, R<3> is an organic group having tertiary carbon bonding to oxygen. In the formula II, R<4> is hydrogen atom, 1-5C alkyl group or the like, each of R<5> and R<6> is the same or different from each other and is hydrogen atom, hydroxide group, halogen atom, carboxyl group, 1-5C alkyl or the like. |