发明名称 X RAY MASK
摘要 <p>PURPOSE:To increase strength aganist external, mechanical impact, by providing a supporter, made of a metal that has a low coefficient of thermal expansion, which supports a thin film of an X ray absorbing layer on which a given pattern is formed. CONSTITUTION:One side of a metal plate 4 that consists mainly Fe, Ni, and Co, and that has a low coefficient of thermal expansion, is covered with a thin film 1 that is made of an inorganic film such as Si, SiO2, Si3N4, or Al2O3, or an organic high-molecular film such as polyethylene terephtalate, or polyamides. Then by using a metal such as Au that absorbs X rays, an absorbing layer 3 with a given pattern is formed on the surface of the thin film 1. A film 5 used for a mask, covers the other surface of the metal plate 4 that is selectively etched, thus leaving only a frame- shaped supporter 2a. Then the film 5 is removed to from an X ray mask. By so doing, strength can be increased significantly comparing to a supporter made of Si single crystal or silica glass.</p>
申请公布号 JPS5519879(A) 申请公布日期 1980.02.12
申请号 JP19780092928 申请日期 1978.07.28
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAGATA KAZUSHI
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
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