| 摘要 |
<p>PURPOSE:To provide the manufacturing method for a liquid crystal display device by the same manufacturing process as the conventional method with a high yield without exerting any adverse influence caused by the masking of a part, which does not require the generation of an anode oxide film, upon MIM element characteristics and further without complicating the manufacturing process in the case of forming the insulated film of the MIM element of the matrix array substrate of the liquid crystal display device by an anode oxidizing method. CONSTITUTION:This method is provided with a process for forming an input electrode terminal to be connected through the wiring electrode of an array substrate duel, the first electrode of the MIM element, process for forming transparent electrodes on a picture element part and an input electrode terminal at least, process for forming a protection film over the transparent electrodes, process for forming the insulated layer of the MIM element by applying anode oxidizing to the surface of the first electrode, process for forming a second electrode 12 of the MIM element on the insulated film, and process for removing the protection film.</p> |
