ALKALINE DEVELOPER FOR RADIATION-SENSITIVE COMPOSITION

摘要

PURPOSE:To provide an alkaline developer for a radiation-sensitive composition capable of dissolving off the alkali-soluble part of a coating film formed from the composition, capable of stably forming many resist patterns having a sharp edge or color filters over a long period and further capable of being concentrated. CONSTITUTION:This alkaline developer for a radiation-sensitive composition is obtained by dissolving an alkaline compd. with the 0.1wt.% aq. soln. kept at >=pH 10, a dipolar-ion org. compd. and at least one kind of surfactant selected from a group consisting of an anionic surfactant, a cationic surfactant and a nonionic surfactant in water. A nonionic surfactant is preferably used as surfactant.