Optisches Schichtmaterial

摘要

Optical film material of a metal oxide is deposited by reactive magnetic field enhanced DC-sputtering from a metallic target and has optical losses of 15dB/cm at the most for a wave-length of light of 633nm. Specific oxides deposited are TiO2 and Ta2O5. TiO2 has for a wave-length of light of 633nm optical losses of 1.5dB/cm at the most, preferably open 0.7dB/cm at the most preferably 0.3dB/cm at the most. Ta2O5 has for light of the wave-length of 633nm optical losses of 3dB/cm at the most, preferably 1.5dB/cm, preferably 0.7dB/cm at the most, preferably 0.3dB/cm at the most. The optical layer is made of optical layer material of a metal oxide deposited by reactive magnetic field enhanced DC-sputtering of a metallic target and having optical losses of 15dB/cm at the most for light of wave-length of 633nm. The method for producing a layer of a metal oxide with optical losses of 15dB/cm at the most for light with a wave-length of 633nm, comprises magnetic field enhanced reactive DC-sputtering of the said layer. This sputtering may be performed with a process working point in the transition mode between the metallic mode and the oxidic mode. The optical film material may be used to produce an optical waveguide.