| 摘要 |
PURPOSE:To obtain a photomask without causing no failure in a scribing by utilizing a reticle for surrounding around a right and left pattern on a pair of target patterns and having a black region common to the patterns. CONSTITUTION:A reticle target pattern 8 has a pair of symmetrical, black target patterns 2a and 2b in one independent section, and the black region 10m surrounding around the circumference of the right and left pattern and acommon black region between the patterns 2a and 2b. A real pattern 3a, 3b... are arranged in a predetermined distance to be baked, and the right directed pattern 2a and left directed pattern 2b of the target pattern are baked in two sections separated from the other. The light is not sensitive in the boundary portion wherein the black region 10m and a black region 4 of a chip pattern are put in turn on each another, therefore a black region 12 for a scribing line can be obtained. |
