发明名称 Method of manufacturing a hetero-junction bi-polar transistor
摘要 A hetero-junction bi-polar transistor provided with a collector composed of a beta - SiC substrate and a base area composed of a beta - SiC layer and an emitter area composed of an alpha - SiC layer, thereby forming a hetero-junction bi-polar transistor having superior heat resistance.
申请公布号 US5350699(A) 申请公布日期 1994.09.27
申请号 US19930059268 申请日期 1993.05.11
申请人 ROHM CO., LTD. 发明人 NII, KEITA
分类号 H01L29/167;H01L21/04;H01L21/331;H01L29/165;H01L29/24;H01L29/73;H01L29/737;(IPC1-7):H01L21/265 主分类号 H01L29/167
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