ECR DEVICE

摘要

PURPOSE: To provide an ECR system which can cancel the reciprocal increasing and decreasing phenomenon between anisotropic etching of a wafer and selecting ratio. CONSTITUTION: This ECR equipment is provided with a wafer retainer 1 having a helium line and a refrigerant flowing pipe in which cooling water flows, and connects the wafer retainer 1 with an RF terminal. A lifting pin 6 vertically lifts up or stably fixes a wafer positioned on the wafer retainer 1. A side surface and a lower surface of the wafer retainer to which RF is applied are isolated with an insulator. Helium tube injects helium gas for cooling from helium introducing port 25 to an area below a wafer substrate. A refrigerant tube circulates cooling water from a refrigerant injection port 33 to a refrigerant flow exit 34, in the wafer retainer 1. Reaction gas is extracted by a vacuum channel and a pumping line. Elevation of a wafer is performed with a four-legs lifter 4.