| 发明名称 |
Photodelineable coatings from hydrogen silsesquioxane resin |
| 摘要 |
Disclosed are compositions which are useful for forming photodelineable coatings on substrates. The compositions contain a solvent, hydrogen silsesquioxane resin and an initiator which generates free radicals upon exposure to radiation.
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| 申请公布号 |
US5348839(A) |
申请公布日期 |
1994.09.20 |
| 申请号 |
US19930034958 |
申请日期 |
1993.03.22 |
| 申请人 |
DOW CORNING CORPORATION |
发明人 |
HALUSKA, LOREN A.;MICHAEL, KEITH W. |
| 分类号 |
G03F7/028;C09D183/04;G03F7/038;G03F7/075;H01L21/027;(IPC1-7):G03C1/72;B05D3/02;C08J3/28 |
主分类号 |
G03F7/028 |
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