发明名称 RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS
摘要 Disclosed is a radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility is an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.
申请公布号 CA1332031(C) 申请公布日期 1994.09.20
申请号 CA19880570471 申请日期 1988.06.27
申请人 BASF AKTIENGESELLSCHAFT 发明人 SCHWALM, REINHOLD;BOETTCHER, ANDREAS;BINDER, HORST
分类号 G03C1/72;G03F7/004;G03F7/039;G03F7/075;(IPC1-7):G03F7/039 主分类号 G03C1/72
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