| 摘要 |
A device for adsorbing impurities in a gas flow has a rotor 1, which has a plurality of adsorption elements 9 distributed in the peripheral direction and having a holed inner wall 3b. The inner walls of the adsorption elements 9 together form an inner peripheral wall 4, which delimits an axial centre duct in the rotor. The device additionally has firstly a fixed desorption duct 10 placed in the centre duct, which desorption duct has a greater width than each adsorption element 9 and has side seals 11a,11b which bear against the inner peripheral wall 4 of the rotor 1 in order to demarcate the desorption duct from the centre duct, and secondly an outlet duct 12, which is placed directly in front of the desorption duct 10 and outside the rotor 1. The device is set up such that the gas flow is conducted radially towards the adsorption elements, through these and radially into the centre duct and such that a hot gas intended for cleaning the adsorption elements is conducted from the desorption duct 10 radially through the inner peripheral wall 4, through the adsorption elements 9 and radially out into the outlet duct 12. The chamber formed by the inner peripheral wall 4, the desorption duct 10 and its side seals 11a,11b is set up to introduce the hot gas into the adsorption elements 9 of the rotating rotor 1 in such a way that the hot gas is introduced therein with a time delay between different levels, viewed in the axial direction. <IMAGE> |
