发明名称 MASK FOR EXPOSURE AND OPTICAL RECORDING MEDIUM
摘要 PURPOSE:To precisely fit a hub to an optical recording medium independently of the track pitch at a low cost by forming a positioning pattern for fitting a hub on the optical recording medium with a mask for exposure having a positioning pattern for fitting a hub. CONSTITUTION:A positioning pattern 46 concentric with a guide layer pattern 45 is formed on an optical recording medium 52 with a mask for exposure having a positioning pattern for fitting a hub. A hub is fixed so that a positioning pattern 26 concentric with a central hole 28 coincides with the positioning pattern 46.
申请公布号 JPH06259814(A) 申请公布日期 1994.09.16
申请号 JP19930042944 申请日期 1993.03.03
申请人 BROTHER IND LTD 发明人 TAKI KAZUYA
分类号 G11B7/24;G11B7/26;G11B23/00 主分类号 G11B7/24
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