发明名称 Device for the surface treatment of substrates by means of plasma influence
摘要 In the case of a device for the surface treatment of substrates by means of plasma influence, a box-shaped anode (1) is provided with an anode base (2) and a border (3). In consequence, the anode (1) encloses five sides of a parallelepiped cavity (8) whose sixth, open side faces the substrates. Magnetic systems (11, 12) are provided outside the border (3) and their polarity and pole positions are such that magnetic field lines (lines of force) pass through the cavity (8), which magnetic field lines are continuous from one side of the border (3), through the cavity (8), to the opposite side of the border (3). <IMAGE>
申请公布号 DE4306611(A1) 申请公布日期 1994.09.08
申请号 DE19934306611 申请日期 1993.03.03
申请人 LEYBOLD AG, 63450 HANAU, DE 发明人 HENRICH, JUERGEN, 6477 LIMESHAIN, DE;HOFMANN, DIETER, 6454 BRUCHKOEBEL, DE;SCHUESLER, HANS, 6685 SCHIFFWEILER, DE;HENSEL, BERND, 6236 ESCHBORN, DE
分类号 H01J37/32;(IPC1-7):H05H1/46;C23F4/00 主分类号 H01J37/32
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