PLASMA TREATING DEVICE

摘要

PURPOSE:To provide a plasma treating device which can prevent the occurrence of such a state that an object to be treated is broken or uniform plasma treatment cannot be performed by detecting the positional deviation of the object to be treated. CONSTITUTION:The title device is provided with a means 140 which detects the value of the electric current flowing through the power supply electric circuit 94 of an electric chuck 40 positioned on one side of counter electrodes 20A and 30 for generating plasma in the circuit 94 and stops the supply of a cooling gas from a gas supplying source 120 and plasma generation in accordance with a change in the current value produced when an object 50 to be treated is positionally deviated on the chuck 40.