| 摘要 |
PURPOSE:To enable an excellent rigid carbon covering film to be produced easily and rapidly with a simple apparatus, by sputtering a carbon target for forming a deposit film on a substrate whose surface is arranged approximately in parallel with an ion beam. CONSTITUTION:An ion beam 9 of an inactive gas from an ion beam source 8 is applied to a carbon target 10 to sputter the carbon. A substrate 11 is arranged such that the surface thereof is approximately parallel to the ion beam 9, and provided with a deposit film. In such a manner, the construction of the apparatus can be simplified since it does not need two ion beam sources, and moreover it can be deposited rapidly since the substrate is arranged very near the target. When hydrogen is mixed into an inactive gas used as the ion beam, the rigid carbon covering film can be obtained with improved transparency and insulating properties. |
