发明名称 TUNABLE COMPACT ELECTRON BEAM GENERATED PLASMA SYSTEM FOR THE DESTRUCTION OF GASEOUS TOXIC COMPOUNDS
摘要 <p>A method and system for destruction of gaseous toxic compounds includes introducing an electron beam into a reaction chamber through an electron beam-pervious window, the chamber having an inlet port and an outlet port for the transport of a gas stream therethrough, the electron beam having a current selected to generate a plasma with a predetermined density of secondary electrons, the secondary electrons having an average electron energy which promotes decomposition of at least one gaseous compound; applying an electric field to the chamber at a field strength selected to generate a predetermined average electron energy of secondary electrons; introducing a gas stream comprising at least one gaseous toxic compound into the chamber at a selected mass flow rate, whereby the gas stream is irradiated with secondary electrons and the gaseous toxic compound decomposes; analyzing the gas stream at a detector downstream from the chamber to determine a residual gaseous toxic compound concentration; and adjusting at least one of the electron beam current, the electric field strength and the mass flow rate responsive to the residual gaseous toxic compound concentration to maintain the concentration at no more than a preselected value.</p>
申请公布号 WO1994017899(A1) 申请公布日期 1994.08.18
申请号 US1994001214 申请日期 1994.02.02
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