发明名称 SEMICONDUCTOR WAFER POLISHING METHOD
摘要 PURPOSE:To prevent trouble such as chipping of a semiconductor wafer held by a carrier between upper and lower disks when polished on both sides by holding the wafer in a hole in the carrier, together with the second annular carrier. CONSTITUTION:Semiconductor wafers 3 held in holes 7A... in a carrier 7 are laid between upper and lower disks 1, 2 mutually reverse-turned. The carrier 7 is autorotated and revolved in accordance with a difference in rotating number between a sun vehicle 5 and an internal gear 6, and the wafers 3 are autorotated in the holes 7A to be polished on both sides. In such a polishing method, each wafer 3 is borne by the second annular carrier 8 and stored in the hole 7A in the carrier 7. The annular carrier 8 is thus functioned as a shock absorber during the autorotation of the wafer 3 to absorb shock applied from the hole 7A in the carrier 7 to the wafer 3 so that the wafer 3 is prevented from chipping when polished.
申请公布号 JPH06226618(A) 申请公布日期 1994.08.16
申请号 JP19930012009 申请日期 1993.01.27
申请人 HITACHI CABLE LTD 发明人 KOMATA CHIKAFUMI;OZAWA SEISHI;AKIYAMA HIROKI
分类号 B24B37/27;B24B37/28;H01L21/304 主分类号 B24B37/27
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