| 摘要 |
PURPOSE:To provide a titanium nitride sputtering target hardly generating particles at the time of sputtering and capable of stably forming a high quality titanium nitride film. CONSTITUTION:This titanium nitride sputtering target is made of a bonded body of titanium nitride particles formed by sintering and nitriding Ti particles and the average diameter of pores existing in this target is 5-20mum, or the average diameter of pores existing in this target is 5-20mum and the average particle diameter of the titanium nitride particles is 5-200mum. |
