发明名称 COMPOUND SEMI-CONDUCTORS AND CONTROLLED DOPING THEREOF
摘要 A method of controlling the amount of impurity incorpo- ration in a crystal grown by a chemical vapor deposition process. Conducted in a growth chamber, the method includes the controlling of the concentration of the crystal growing components in the growth chamber to affect the demand of particular growth sites within the growing crystal thereby controlling impurity incorporation into the growth sites.
申请公布号 CA2113336(A1) 申请公布日期 1994.07.26
申请号 CA19942113336 申请日期 1994.01.12
申请人 OHIO AEROSPACE INSTITUTE 发明人 LARKIN, DAVID J.;NEUDECK, PHILIP G.;POWELL, J. ANTHONY;MATUS, LAWRENCE G.
分类号 C30B25/02;C30B25/18;H01L21/205;H01L21/365 主分类号 C30B25/02
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