发明名称 Process for exposing a photosensitive resin composition to light
摘要 The present invention provides an improved process by which dissolved oxygen is effectively removed from a photosensitive resin layer of a photosensitive resin plate. The process comprises preliminarily exposing the photosensitive resin to light to quench oxygen dissolved in said photosensitive resin layer before conducting a main exposure. The photosensitive resin layer is prepared from a photosensitive resin composition which comprises: (a) a polymer binder, (b) a radically polymerizable monomer, (c) a sensitizing dye, and (d) a photopolymerization initiator which is excited by a light of a different wave length from a light exciting the sensitizing dye. The preliminary exposure is conducted with a light only exciting the sensitizing dye and the main exposure is conducted with a light exciting the photopolymerization initiator.
申请公布号 US5330882(A) 申请公布日期 1994.07.19
申请号 US19910709964 申请日期 1991.06.04
申请人 NIPPON PAINT CO., LTD. 发明人 KAWAGUCHI, CHITOSHI;ARIMATSU, SEIJI;KONISHI, KATSUJI;KANDA, KAZUNORI
分类号 G03F7/20;(IPC1-7):G03C5/00 主分类号 G03F7/20
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