发明名称 |
Method for depositing aluminum layers on insulating oxide substrates |
摘要 |
A manufacturing method which includes forming a metallic, aluminum-containing layer adherent to a surface of a body. The method includes the steps of depositing aluminum on the surface from an aluminum-containing vapor, and during the aluminum-depositing step, the further step of depositing arsenic, phosphorus, or antimony on the surface from the vapor.
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申请公布号 |
US5330629(A) |
申请公布日期 |
1994.07.19 |
申请号 |
US19920990959 |
申请日期 |
1992.12.15 |
申请人 |
AT&T BELL LABORATORIES |
发明人 |
CUNNINGHAM, JOHN E.;JAN, WILLIAM Y.;RENTSCHLER, JOHN A.;WARWICK, COLIN A. |
分类号 |
C23C14/06;H01L21/203;H01L21/3205;H01L21/768;H01L23/532;(IPC1-7):C23C4/08 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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