发明名称 Method for depositing aluminum layers on insulating oxide substrates
摘要 A manufacturing method which includes forming a metallic, aluminum-containing layer adherent to a surface of a body. The method includes the steps of depositing aluminum on the surface from an aluminum-containing vapor, and during the aluminum-depositing step, the further step of depositing arsenic, phosphorus, or antimony on the surface from the vapor.
申请公布号 US5330629(A) 申请公布日期 1994.07.19
申请号 US19920990959 申请日期 1992.12.15
申请人 AT&T BELL LABORATORIES 发明人 CUNNINGHAM, JOHN E.;JAN, WILLIAM Y.;RENTSCHLER, JOHN A.;WARWICK, COLIN A.
分类号 C23C14/06;H01L21/203;H01L21/3205;H01L21/768;H01L23/532;(IPC1-7):C23C4/08 主分类号 C23C14/06
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