MICROWAVE PLASMA TREATING DEVICE

摘要

PURPOSE:To provide a microwave plasma treating device where a work is free from electrical damage and contamination caused by plasma by a method wherein a microwave distribution cavity resonator which distributes microwaves transmitted through a waveguide and feeds them to a treating chamber is provided between the waveguide and the treating chamber. CONSTITUTION:Microwaves efficiently transmitted through a waveguide 101 are fed into a microwave distribution cavity resonator 102 through the intermediary of a microwave lead-in antenna 103, wherein the cavity resonator 102 distributes microwaves and feeds them to a treating chamber 113. The microwave lead-in antenna 103 is provided between the waveguide 101 and the microwave distribution cavity resonator 102, located nearly at the center of the microwave distribution cavity resonator 102, and electrically isolated from the treating chamber 113. By this setup, a work can be protected against electrical damage and contamination caused by plasma.