发明名称 DEVICES BASED ON SI/GE
摘要 High speed transistor devices for use in high speed circuitry such as laser driver circuitry are formed by utilizing a high temperature deposition process. For example, chemical vapor deposition performed at temperatures on the order of 900 DEG C for deposition of Si/Ge materials leads to bipolar devices having excellent properties. In particular, such devices are mechanically stable and are relatively defect free.
申请公布号 EP0490531(A3) 申请公布日期 1994.07.13
申请号 EP19910311018 申请日期 1991.11.28
申请人 AMERICAN TELEPHONE AND TELEGRAPH COMPANY 发明人 BRASEN, DANIEL;FELDMAN, LEONARD CECIL;GREEN, MARTIN LAURENCE;WEIR, BONNIE ELAINE
分类号 C30B25/00;C30B29/00;H01L21/205;H01L21/331;H01L29/16;H01L29/73;H01L29/737;H01L29/76;H01L29/772;(IPC1-7):H01L21/203;H01L21/203 主分类号 C30B25/00
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