发明名称 PROCESS FOR PRODUCING A DEVELOPER HAVING A LOW METAL ION LEVEL
摘要 <p>The present invention provides a process for producing a developer containing a surfactant which contains a very low level of metal ions and a process for developing light sensitive photoresist compositions, using such a developer, to produce semiconductor devices.</p>
申请公布号 WO1994015262(A1) 申请公布日期 1994.07.07
申请号 US1993012405 申请日期 1993.12.20
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