发明名称 METHOD FOR DISSOLVING OXIDES DEPOSITED ON A METAL SUBSTRATE
摘要 <p>A method for decontaminating substrates polluted by deposits of radioactive materials without substantially attacking the substrate. The method comprises the steps of a) carrying out an oxidative attack with a solution containing at least permanganate, at a temperature of 80-85 °C, and b) carrying out a reducing attack with a solution containing a reducing agent and nitric acid, at a pH under 2 and at a temperature of 80-85 °C.</p>
申请公布号 WO1994015001(A2) 申请公布日期 1994.07.07
申请号 FR1993001298 申请日期 1993.12.23
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