| 摘要 |
PURPOSE:To provide a target suitable for a magnetron system sputtering device without damaging characteristics of the structure such that uniformity of the thin film composition is superior and the mechanical workability is excellent, and its production method. CONSTITUTION:The sintered compact has a microstructure in which there is present both a particle A<=200mum in the average particle size in which an eutectic structure of both rare earth metal and iron group metal is a basal phase and which is a single substance of the iron group metal or an alloy between the iron group metal in the basal phase and a particle B<=200mum in the average particle size which is the alloy of both one kind or more metal selected from Ti, Al, Cu, Cr, Nb, Ta, Pb and Pt and the iron group metal, and the target for optomagnetic recording medium is <=25 in the max. permeability of the sintered compact and respective average particle sizes of the particle A and the particle B to the average size combined of the particle A with the particle B preferably satisfy within 20% of a tolerance. |
