发明名称 Movement hampering device for an exposure apparatus
摘要 The exposure apparatus is provided with a first mirror frame movement hampering means for hampering the movement of the first mirror frame in the exposing direction. The first mirror frame movement hampering means has a closure mounted on an operating opening on the main body and a movement hampering member mounted on the closure and positioned near a linking portion of the driving device of the first mirror frame and at a position at which the movement in the exposing direction is interfered. The movement hampering member is mounted on the closure to adjust its position freely within a predetermined range in the reciprocatingly moving direction of the first mirror frame.
申请公布号 US5327198(A) 申请公布日期 1994.07.05
申请号 US19920966457 申请日期 1992.10.26
申请人 MITA INDUSTRIAL CO., LTD. 发明人 KITAGAWA, SHOICHI;MIYAMOTO, MITSUGU;HAYASHI, DAISUKE;ISHIDA, HIDEKI;KUSUMOTO, HIROSHI
分类号 G03B27/50;G03G15/04;(IPC1-7):G03G15/28 主分类号 G03B27/50
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