| 摘要 |
A hologram exposure system for simultaneously exposing a plurality of holograms in a holographic recording layer, including first optical elements for providing a first reference beam and a first object beam that interfere in the holographic recording layer and are coherently matched relative to each other, and second optical elements for providing a second reference beam and a second object beam that interfere in the holographic recording layer and are coherently matched relative to each other but are coherently mismatched relative to the first reference and object beams, whereby the crosstalk holograms formed by interference of (1) the first reference beam with the second object beam, (2) the first object beam with the second reference beam, (3) the first object beam with the second object beam, and (4) the first reference beam with the second reference have reduced efficiencies.
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