| 摘要 |
PURPOSE:To provide the black matrix substrate having high dimensional accuracy and excellent light shieldability at a low cost by heat treating a transparent substrate, fixing metals to a relief to form the catalyst-contg. relief and forming the black relief. CONSTITUTION:A photosensitive resist contg. a hydrophilic resin is applied on the transparent substrate 13 to form a photosensitive resist layer 3. This photosensitive resist layer 3 is then exposed via a photomask 9 for the black matrix (black relief). The photosensitive resist layer 3 after the exposing is developed to form the relief 4 having patterns for the black matrix. After the transparent substrate 13 is heat treated, the metals to serve as the catalyst for electroless plating are fixed to the relief 4 to form the catalyst-contg. relief 5. The catalyst-contg. relief 5 on the transparent substrate 13 is brought into contact with an electroless plating liquid, by which the black relief is formed. The black matrix 14 is thus formed. |
