发明名称 EXPOSURE DEVICE FOR OPTICAL MASTER DISK
摘要 PURPOSE:To provide the device which decreases a temp. drift and has high cost effectiveness by branching a beam for exposure to first order diffracted light and zero order light by a light quantity modulating means and making the respective branched light beams incident on the main optical axis and the optical axis exclusive of the main optical axis of an A/O deflector 6. CONSTITUTION:The beam A for exposure is subjected to light quantity modulation by the light quantity modulating means 3 and is branched to the first order diffracted light Ax and the zero order light Ay by a built-in branching means. The A/O deflector 6 is so disposed that the light Ax is made incident on the main optical axis P of the deflector 6 through a signal modulating means 4 and that the light Ay is made incident on the optical axis Q exclusive of the main axis P. The temp. change on the element is lessened and the temp. drifts are decreased by the constitution that the zero order light is made incident on the deflector 6 at all times. The exposure device for optical master disks which can suppress the angle drift of the output beams to a min. and has the high cost effectiveness is obtd.
申请公布号 JPH06176409(A) 申请公布日期 1994.06.24
申请号 JP19920326639 申请日期 1992.12.07
申请人 RICOH CO LTD 发明人 MORIMOTO TAKAO
分类号 G03F7/20;G11B7/125;G11B7/26;H01L21/027 主分类号 G03F7/20
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