发明名称 PRODUCTION OF HIGH PURITY COPPER
摘要 <p>PURPOSE:To produce efficiently high purity copper by adding specified amount of hydrogen halide acid to suppress the bubbling of gaseous nitrous acid. CONSTITUTION:In the production of the high purity copper by electropurification of an electrolytic copper which uses a copper nitrate soln. as an electrolyte and produces secondarily a gaseous nitrous acid bubble on the surface of the cathode to which copper electrodeposites, hydrogen halide acid is added in the electrolyte at the amount which suppresses the bubbling of gaseous nitrous acid. In this way, since the bubbling of nitrous acid at the surface of the cathode is suppressed thoroughly, and smooth and dense electrodeposited surface is obtained, and a high purity copper is produced efficiently without the drop of current efficiency due to a dendrite and the deterioration in the quarity of a produced copper due to the involving of the electrolyte or the impurity.</p>
申请公布号 JPH06173063(A) 申请公布日期 1994.06.21
申请号 JP19920345590 申请日期 1992.12.01
申请人 MITSUBISHI MATERIALS CORP 发明人 KIMURA ETSUJI;YAMAGUCHI KENICHI;ITO SUGIO
分类号 C25C1/12;C25C3/18;(IPC1-7):C25C1/12 主分类号 C25C1/12
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