| 摘要 |
PURPOSE:To obtain a radiation-sensitive agent for positive type resist, sensitizing radiation, providing a positive type resist suitable for especially preparing an integrated circuit by blending an alkali-soluble resin. CONSTITUTION:Tetrahydroxybenzophenone is reacted with a 1,2- quinonediazidosulfonic acid halide in the presence of an amine. A radiation- sensitive for positive type resist having a high ratio of tetraester free from admixture of a very small amount of metal residue derived from a basic catalyst used is obtained. The prepared radiation-sensitive for positive type resist can provide a positive type resist capable of supplying excellent developing properties and high resolution. The positive type resist can be sensitized with radiation such as ultraviolet light, far ultraviolet light, X-ray, electron beam, molecular beam, gamma-ray, synchrotron radiation or proton beam and is especially suitable as a resist for preparing an integrated circuit. |
