发明名称 |
Electroformed buried gratings for high-power shared aperture systems |
摘要 |
A two-metal grating is produced by vacuum depositing a first dielectric coating upon a separation layer formed upon a mandrel; then depositing a first optically opaque metallic layer, etching the layer to form stripes; then vacuum depositing a second optically opaque film; then electroforming a backing structure and separating the dielectric coating from the separation layer on the mandrel to form a free-standing grating structure having a smooth surface. This structure can then be affixed to a metallic mirror. A buried phase grating can also be fabricated by additionally depositing a second dielectric layer and a third metallic layer.
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申请公布号 |
US5323266(A) |
申请公布日期 |
1994.06.21 |
申请号 |
US19930023506 |
申请日期 |
1993.02.26 |
申请人 |
UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE |
发明人 |
FLINT, GRAHAM W.;TUENGE, STEPHEN R. |
分类号 |
G02B5/18;(IPC1-7):G02B5/18;G02B5/28;G02B27/44 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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