发明名称 Electroformed buried gratings for high-power shared aperture systems
摘要 A two-metal grating is produced by vacuum depositing a first dielectric coating upon a separation layer formed upon a mandrel; then depositing a first optically opaque metallic layer, etching the layer to form stripes; then vacuum depositing a second optically opaque film; then electroforming a backing structure and separating the dielectric coating from the separation layer on the mandrel to form a free-standing grating structure having a smooth surface. This structure can then be affixed to a metallic mirror. A buried phase grating can also be fabricated by additionally depositing a second dielectric layer and a third metallic layer.
申请公布号 US5323266(A) 申请公布日期 1994.06.21
申请号 US19930023506 申请日期 1993.02.26
申请人 UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE 发明人 FLINT, GRAHAM W.;TUENGE, STEPHEN R.
分类号 G02B5/18;(IPC1-7):G02B5/18;G02B5/28;G02B27/44 主分类号 G02B5/18
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