发明名称 EXPOSURE DEVICE
摘要 <p>PURPOSE:To control the fine clearance between two glasses by a simple constitution by detecting the clearance between a work and a mask by a gap sensor for detecting a metallic thin film provided to a work and a thin film metal of the work on the same plane as the mask. CONSTITUTION:A metallic thin film 2 is provided to a part of a work 1 on a surface facing mask 3. A substrate glass 1 which is a work is fixed to a frame, and a glass frame 4 is so held that the mask glass 3 and an electrostatic capacity type gap sensor 5 are flush with each other is mounted on a ball screw 8. The bass screw 8 rotates right and left by rotation of a motor 9, and moves the mask glass frame 4 to approach or leave the substrate glass 1. A clearance between the mask glass 3 and the substrate glass 1 is detected by measuring a distance with the metallic thin film 2 by the electrostatic capacity type gap sensor 5 held flush with the mask glass 3. It is necessary for a thickness of the metallic thin film 2 in an outer peripheral part of the substrate glass 1 to be enough small in comparison with the clearance.</p>
申请公布号 JPH06163347(A) 申请公布日期 1994.06.10
申请号 JP19920310440 申请日期 1992.11.19
申请人 TOPPAN PRINTING CO LTD 发明人 FUSHIMI YOSHIHIRO;FUJINUMA SUSUMU;MITA TOMOKO
分类号 G02B5/20;G03B27/02;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B5/20
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