APARELHO PARA TRATAMENTO POR PLASMA E PARA REVESTIMENTO COM PELICULA FINA E PROCESSO DE PREPARACAO DE UM SUBSTRATO

摘要

A plasma treating apparatus is useful for coating substrates with thin films having vapor barrier properties at relatively rapid deposition rates. The apparatus comprises an evacuable chamber, an electrically powered electrode defining a plasma-facing surface within the chamber, and a shield spaced a distance DELTA transverse to the plasma-facing surface. During plasma treatments, the plasma is confined to within distance DELTA while a substrate is continuously fed through the confined plasma.