| 摘要 |
<p>PURPOSE:To quickly execute optical inspection after defect correction by forming a clearance gap between a pixel electrode and a substrate part confronting with it smaller than that between a part other than the pixel electrode and the substrate part. CONSTITUTION:A source bus line 3 and the pixel electrode 4 formed in matrix shape are provided on a substrate 1 out of the substrates 1, 2 confronting with each other via liquid crystal 12, and transference conductive film 9 is formed on the source bus line 3. Furthermore, protective film 5 are formed on a part of the pixel electrode 4 and the transference conductive film 9, and orientation film 6 is formed on the entire plane of the substrate 1 on which those components are formed. Also, light shielding film 8, the transference conductive film 9, and orientation film 10 are formed on the substrate 2. In such a case, the clearance gap between the pixel electrode 4 and the orientation film 10 confronted with it can be set smaller than that of the part other than the pixel electrode 4 by forming the pixel electrode 4 so as to cover transference insulating film 7 provided on the substrate 1. Therefore, bubbles generated when the defect of a pixel part is corrected can be collected on a wiring part other than the pixel part.</p> |
