发明名称 PHOTOMASK AND ITS PRODUCTION
摘要 PURPOSE:To suppress the diffraction of light, to form patterns with good accuracy and to inexpensively form patterns by providing the light transparent parts of a light transparent substrate having the light transmissive parts and light non-transmissive parts with convex lens functions. CONSTITUTION:The surface of the mask substrate 1 consisting of light transmissive for example, glass, quartz, etc., is provided with the light non-transmissive parts 2... and the light transmissive parts 3.... These light non-transmissive parts 2... are obtd. by forming the patterns on the base of the design pattern drawings of the constituting members of, for example, a micromachine on the mask substrate 1. The light transmissive parts 3... are formed with lens parts 4... as the very small convex lens shapes having the diameter of nearly the same size as the size of the light transmissive parts 3... so that only the light past the light transmissive parts 3... is converged to a photoresist 5 as the photosensitive material applied on a substrate 6 by the lens parts 4....
申请公布号 JPH06148861(A) 申请公布日期 1994.05.27
申请号 JP19920304143 申请日期 1992.11.13
申请人 SHARP CORP 发明人 INUI TETSUYA;KIMURA KAZUHIRO;HIRATA SUSUMU;ISHII YORISHIGE;OTA KENJI
分类号 B81C99/00;G03F1/68;G03F1/80 主分类号 B81C99/00
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