| 摘要 |
PURPOSE:To prepare several sampled common patterns without manufacturing a reticle accuracy-confirmation pattern for every kind and layer of the device to be designed and to assure the manufacturing accuracy of the mask pattern of a device to be designed without giving the shift treatment to the reticle accuracy-confirmation pattern. CONSTITUTION:The reticule accuracy-confirmation pattern is a pattern for confirming the reticle manufacturing accuracy and is constituted by providing with a sampled pattern pn having the maximum width Xmax produced by fattening, at an arbitrary interval, a sampled pattern p1 having the approximate minimum width Xmin required in the semiconductor device to be designed. Further, in the reticle 13 for transferring the maskpattern 11 of the semiconductor device, the reticle is constituted by providing with the reticle accuracy- confirmation pattern 12 at the outside of the region of the maskpattern 11 and consisting of an pieces of sampled patterns p1 to pn previously added with the reticle accuracy conformation pattern 12. |
