发明名称 Semiconductor power device having walls of an inverted mesa shape to improve power handling capability
摘要 A semiconductor device of vertical arrangement includes an anode region formed of a first semiconductor substrate and a second semiconductor substrate joined with the first semiconductor substrate. The first semiconductor substrate forms a high-resistance layer with a predetermined impurity density, and the second semiconductor substrate forms a low-resistance layer whose impurity density is higher than that of the high-resistance layer. A PN junction is formed inside the first semiconductor substrate. The periphery of the first semiconductor substrate including the PN junction is configured in an inverted mesa structure and coated with an insulation material. With this arrangement, the semiconductor device has a high withstand voltage and enables an employment of a large diameter wafer.
申请公布号 US5313092(A) 申请公布日期 1994.05.17
申请号 US19920844889 申请日期 1992.03.03
申请人 NIPPON SOKEN, INC. 发明人 TSURUTA, KAZUHIRO;KATADA, MITUTAKA;FUJINO, SEIJI;YAMAOKA, MASAMI
分类号 H01L21/18;H01L21/331;H01L21/336;H01L21/762;H01L21/78;H01L27/088;H01L29/06;H01L29/732;H01L29/739;H01L29/78;(IPC1-7):H01L29/06 主分类号 H01L21/18
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