| 摘要 |
PURPOSE:To inexpensively produce the black matrix substrate by incorporating chromium as an essential component and a specific ratio or above of metal elements baser than the chromium or elements which release nascent hydrogen when dissolved by an acid into a light shielding film. CONSTITUTION:This substrate consists of a substrate 1, color filters 2, a protective film 3, a conductive film 4 and the light shielding film 5. The quantity of the additive metal elements to be added to the light shielding film 5 suffices with >=0.5 atomic %. The chromium light shielding film 5 is etched at a sufficient speed simply by immersing the substrate into an inexpensive etching liquid of chlorine, etc., if the above-mentioned elements are incorporated at >=0.5 atomic % into the light shielding film. The patterning of the light shielding film 5 is executed by forming the light shielding film 5 on the glass substrate 1, applying a resist film thereon and forming prescribed patterns by photolithography, then wet etching the film. The preferable metals to be added are aluminum, magnesium, manganese, etc., as the metallic elements baser than the chromium, in addition to zinc. Iron, lead, etc., which are nobler than metals and generate the nascent hydrogen by dissolving in the acid are adequate as well. |
