发明名称 Method of measuring optical characteristics of thin film and apparatus therefor
摘要 In a first step, the value of the synthetic retardation and the direction of the synthetic optical axis as angle data of a transparent substrate having a thin film thereon are measured. In a second step, the value of the retardation and the direction of an optical axis as angle data of only the transparent substrate are measured. In a third step, the value of the retardation and the direction of an optical axis as an angle of only the thin film are calculated in accordance with the following equations on the basis of the value of the retardation and the angle data of the direction of the optical axis which are calculated in the first step and the value of the retardation and the angle data of the direction of the optical axis of only the transparent substrate which are calculated in the second step: DELTA 1 = { DELTA 212 + DELTA 22 - 2 DELTA 12 DELTA 2 cos2 ( theta 12 - theta 2)}1/2
申请公布号 US5311284(A) 申请公布日期 1994.05.10
申请号 US19920909630 申请日期 1992.07.07
申请人 CASIO COMPUTER CO., LTD. 发明人 NISHINO, TOSHIHARU
分类号 G01M11/00;G01B11/06;G01N21/21;G01N21/84;G02B27/28;(IPC1-7):G01J4/00 主分类号 G01M11/00
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