发明名称 GAS LASER SYSTEM AND OPERATING METHOD THEREOF
摘要 PURPOSE:To purify the laser gas medium by using an adsorbent cooled down at the temperature not to coagulate the whole component of the laser gas medium. CONSTITUTION:An adsorbent 10 is previously activated later to let Kr saturation-adsorb thereat. The inside of an adsorption tower 9 is to be cooled down by a refrigerator 11 at the temperature not to coagulate the component of gas medium. In order to operate the KrF excimer laser, specific component of the laser gas is led into the laser tube 11 through a valve 4 and then the other valves 6, 7 are opened to let the laser gas medium circulate through adsorption tower 9 simultaneously starting the discharge to oscillate the laser. Next, the gas medium is led into the adsorption tower 9 through the valve 6 wherein any impurities are adsorbed by an adsorbent so that the purified gas may be recirculated in the laser tube 1 through the intermediary of a pump 8 and the valve 7. In such a constitution, when the impurities come into contact with the adsorbent, the Kr previously adsorbed by the adsorbent may be precedently substituted for the impurities thereby enabling the gas to be purified.
申请公布号 JPH06125127(A) 申请公布日期 1994.05.06
申请号 JP19910132914 申请日期 1991.06.04
申请人 SUMITOMO HEAVY IND LTD 发明人 MITSUI JIN
分类号 H01S3/036;H01S3/08;H01S3/0979;H01S3/225;(IPC1-7):H01S3/097 主分类号 H01S3/036
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