发明名称 Method for forming patterned transparent conducting film.
摘要 <p>Printing is conducted at the transparent conducting film unnecessary portion on a substrate 1 with a masking ink having a higher thermal decomposition temperature than that of the transparent conducting film forming composition, and the ink is dried and cured by heat or light to form a masking pattern 2. The portion where a transparent conducting film is to be formed is preferably subjected to ozone cleaning and then coated with a transparent conducting film forming composition comprising an indium compound and/or a tin compound and a solvent to form a transparent conducting film forming composition layer 3. The thus worked substrate is subjected to a heat treatment, causing thermal decomposition of the masking pattern 2 after formation of a transparent conducting film. Then the residues of the masking ink and the transparent conducting film are removed to finally obtain a desired patterned transparent conducting film 4. &lt;IMAGE&gt;</p>
申请公布号 EP0594932(A1) 申请公布日期 1994.05.04
申请号 EP19930104468 申请日期 1993.03.18
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD 发明人 HATTORI, AKIYOSHI;HORI, YOSHIHIRO;YOSHIDA, AKIHIKO
分类号 C03C17/42;B41M3/00;C23C18/12;G02F1/1343;H01B13/00;H05B3/84;H05K1/09;H05K3/10;H05K3/12;(IPC1-7):H05K3/14 主分类号 C03C17/42
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