发明名称 |
Method for forming patterned transparent conducting film. |
摘要 |
<p>Printing is conducted at the transparent conducting film unnecessary portion on a substrate 1 with a masking ink having a higher thermal decomposition temperature than that of the transparent conducting film forming composition, and the ink is dried and cured by heat or light to form a masking pattern 2. The portion where a transparent conducting film is to be formed is preferably subjected to ozone cleaning and then coated with a transparent conducting film forming composition comprising an indium compound and/or a tin compound and a solvent to form a transparent conducting film forming composition layer 3. The thus worked substrate is subjected to a heat treatment, causing thermal decomposition of the masking pattern 2 after formation of a transparent conducting film. Then the residues of the masking ink and the transparent conducting film are removed to finally obtain a desired patterned transparent conducting film 4. <IMAGE></p> |
申请公布号 |
EP0594932(A1) |
申请公布日期 |
1994.05.04 |
申请号 |
EP19930104468 |
申请日期 |
1993.03.18 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD |
发明人 |
HATTORI, AKIYOSHI;HORI, YOSHIHIRO;YOSHIDA, AKIHIKO |
分类号 |
C03C17/42;B41M3/00;C23C18/12;G02F1/1343;H01B13/00;H05B3/84;H05K1/09;H05K3/10;H05K3/12;(IPC1-7):H05K3/14 |
主分类号 |
C03C17/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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