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发明名称
CHARGED-PARTICLE BEAM EXPOSURE METHOD AND DEVICE
摘要
申请公布号
JPH06112111(A)
申请公布日期
1994.04.22
申请号
JP19920256592
申请日期
1992.09.25
申请人
FUJITSU LTD
发明人
YANO KEIKO
分类号
G03F7/20;H01L21/027;(IPC1-7):H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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