Improvements in photo-masks.

摘要

The invention relates to photo-masks which comprise a light-permeable substrate (1) and a plurality of light-shielding films (2) that are disposed on the substrate (1), the light-shielding films (2) forming a mask pattern. In one embodiment, a light-permeable protective film (3) is disposed over the surface of the substrate (1) including the light-shielding films (2) so as to protect the light-shielding films (2). In another embodiment the light-shielding films (2) are buried in the substrate (1) so that the outer surface of each of the light-shielding films (2) is either above or below the surface of the substrate (1). The light-shielding films (2) may be made of an electrically conductive material or of a dielectric substance.