发明名称 Process of producing diffraction grating
摘要 A process of producing a diffraction grating comprises the steps of forming a coating layer on a first diffraction grating layer of a resin formed on a substrate without damaging the diffraction grating layer, removing a portion of the coating layer positioned on the first diffraction grating layer by etching to form a second diffraction grating layer of the coating layer having the reverse phase to that of the first diffraction grating layer, removing the first diffraction grating layer, and etching the substrate with a mask of the second diffraction grating layer, so that the diffraction grating having the reverse phase can be easily produced. When the first diffraction grating layer is left and both the first and second diffraction grating layers are used as a mask, the diffraction grating having a period half times as large as that of the first grating layer can be easily produced.
申请公布号 US5300190(A) 申请公布日期 1994.04.05
申请号 US19920947981 申请日期 1992.09.21
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 SUGIMOTO, HIROSHI;MATSUI, TERUHITO;OHTSUKA, KEN-ICHI;ABE, YUJI;OHISHI, TOSHIYUKI
分类号 G02B6/12;G02B6/124;G03F7/00;H01S5/12;(IPC1-7):G02B5/18;H01L21/308 主分类号 G02B6/12
代理机构 代理人
主权项
地址