Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound

摘要

A radiation-sensitive mixture suitable for producing relief patterns comprises (a) a water-insoluble but alkali-soluble polymeric binder, (b) an organic compound whose solubility in an alkaline developer is increased by the action of acid and which contains at least one acid-cleavable group and additionally a group which forms a strong acid on irradiation, and additionally (c) an organic compound which reacts with water or stronger nucleophiles at up to 120 degrees C.