发明名称 Metallic contact surfaces for semiconductor substrate - with opposing edges of adjacent contacts surfaces parallel to crystallographic grid direction of semiconductor
摘要 The metallic contact surfaces (2) lie adjacent one another on the surface of the semiconductor substrate (1) with their opposing edges at a relatively sort distance apart. These edges lie parallel to a crystallographic grid direction of the semiconductor. Pref. the contact surfaces comprise a multi-layer system with AuSn alloy, Ti, Pt, and Au layers in succession. A narrow contact surface strip (3) is pref. provided between the opposing edges of the adjacent contact surfaces. ADVANTAGE - Prevents edge roughness of metallic contact layers.
申请公布号 DE4232814(A1) 申请公布日期 1994.03.31
申请号 DE19924232814 申请日期 1992.09.30
申请人 ALCATEL SEL AG, 70435 STUTTGART, DE 发明人 REEMTSMA, JAN-HINNERK, DR.RER.NAT., 7015 KORNTAL-MUENCHINGEN, DE
分类号 H01L23/482;H01L23/528;H01L29/04;H01L29/417;(IPC1-7):H01L23/52;H01L21/285 主分类号 H01L23/482
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